Transport Properties of Metallic Nanowires on Silicon Subst Rate

Abstract

This paper presents the electrical properties of the randomly distributed metal/le (Co, Ni and Fe) nano/micro wires on Silicon. Deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the Sil/con substrate. Spin coated films were Irradiated with 150MeV NI (+11) Ions at a fluence of Bel ions/cm2 , followed by UV irradiation and chemical etching in aqueous NaOH (6N, at room temperature]. Later morphological, and electrical properties of the deposited Nano-I microstructures were studied.