Nano-Patterning of 16-Mha Over Palladium Substrate Using Dip-Pen Nano-Lithography (Dpn)

Abstract

In this paper, the nanowriting process over palladium substrate with 16-MHA ink has been established using Dip-Pen Nanolithography. For nanowriting, the substrate was fabricated with very low rms roughness (˜0.64nm) using e-beam deposition technique. After ink calibration, the lines and dots were fabricated with 5mM ink of 16-MHA. The width/diameter estimation of patterns was done in NanoRule image analysis software. The effect of humidity along with varying speed/dwell time is also demonstrated and results are explained in detail. The measured minimum line width ˜269nm and dot diameter ˜602 nm was successfully achieved. These SAM patterns could be very useful for positioning of carbon nanotubes (CNTs). The low contact resistance of Pd with CNTs would also be an additional advantage.