Please use this identifier to cite or link to this item: https://gnanaganga.inflibnet.ac.in:8443/jspui/handle/123456789/6880
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dc.contributor.authorBarry Luther-Davies-
dc.contributor.authorAndrei V. Rode-
dc.date.accessioned2024-02-27T06:04:50Z-
dc.date.available2024-02-27T06:04:50Z-
dc.date.issued2005-
dc.identifier.urihttp://gnanaganga.inflibnet.ac.in:8080/jspui/handle/123456789/6880-
dc.description.abstractWe report experiments on the ablation of arsenic trisulphide and silicon using high-repetition-rate (megahertz) trains of picosecond pulses. In the case of arsenic trisulphide, the average single pulse fluence at ablation threshold is found to be > 100 times lower when pulses are delivered as a 76-MHz train compared with the case of a solitary pulse. For silicon, however, the threshold for a 4.1-MHz train equals the value for a solitary pulse. A model of irradiation by high-repetition-rate pulse trains demonstrates that for arsenic trisulphide energy accumulates in the target surface from several hundred successive pulses, lowering the ablation threshold and causing a change from the laser-solid to laser-plasma mode as the surface temperature increases.-
dc.publisherOptical Engineering-
dc.titlePicosecond High-Repetition-Rate Pulsed Laser Ablation of Dielectrics- the Effect of Energy Accumulation Between Pulses-
dc.volVol. 44-
dc.issuedNo. 5-
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