Please use this identifier to cite or link to this item: https://gnanaganga.inflibnet.ac.in:8443/jspui/handle/123456789/7474
Title: On the Damage Behavior of Dielectric Films When Illuminated with Multiple Femtosecond Laser Pulses
Authors: Mark Mero
Benjamin Clapp
Issue Date: 2005
Publisher: Optical Engineering
Abstract: The physical effects reducing the damage threshold of dielectric films when exposed to multiple femtosecond pulses are investigated. The measured temperature increase of a Ta2O5 film scales exponentially with the pulse fluence. A polarized luminescence signal is observed that depends quadratically on the pulse fluence and is attributed to twophoton excitation of self-trapped excitons that form after band-to-band excitation. The damage fluence decreases with increasing pulse number, but is independent of the repetition rate from 1 Hz to 1 kHz at a constant pulse number. The repetition rate dependence of the breakdown threshold is also measured for TiO2 , HfO2 , Al2O3 , and SiO2 films. A theoretical model is presented that explains these findings.
URI: http://gnanaganga.inflibnet.ac.in:8080/jspui/handle/123456789/7474
Appears in Collections:Articles to be qced

Files in This Item:
File SizeFormat 
On the damage behavior of dielectric films.pdf
  Restricted Access
4.47 MBAdobe PDFView/Open Request a copy


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.